The Aspen III eHighlands is a dry strip system designed for critical front-end-of-line and back-end-of-line sub-90 nm process applications. The system features an inductively coupled plasma source and a bias capability that enables independent control of ion energy and ion density at low pressures to minimize damage to low-k materials. It features a three-in-one integration scheme of the low-k strip, barrier removal and copper surface treatment processes, performed in situ. The system is available in 200 and 300 mm versions. Mattson Technology Inc.,
　　 www.mattson.com.